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TECHNICAL PROGRAM COMMITTEE W.R. Tonti, Chair | ||||||
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Assembly and Packaging T.M. Moore, Chair S. Sidharth, Vice Chair J.M. Anthony P.F. Bechtold R.C. Blish J. Ewanich C. Grosskopf J.T. McCullen Compound Semiconductors & Opto F. Fantini, Chair J.J. Liou, Vice Chair M. Dammann M. Fukuda T. Henderson C. Huang | ||||||
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A. Touboul C. Wai Kin R.N. Wallace Device & Process E.A. Amerasekera, Chair K.F. Schuegraf, Vice Chair J.M. Hicks K. Kubota F.G. Kuper B.-K. Liew N.E. Lycoudes M. Rowlandson J.M. Soden K. Takeuchi Device Dielectrics E. Rosenbaum, Chair E. Wu, Vice Chair R. Degraeve A.B. Joshi | |||||
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B.T. Moore J. Sune S. Takagi R.P. Vollertsen B.E. Weir ESD and Latch-up C. Duvvury, Chair R.J. Gauthier, Vice Chair W. Anderson K. Bock T.J. Maloney J. Smith W. Stadler Failure Analysis D.L. Barton, Chair J.C.H. Phang, Vice Chair K. Bernhard-Hoefer K. Nikawa D.P. Vallett | ||||
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L.C. Wagner Hot Carriers R.C. Lacoe, Chair G. La Rosa, Vice Chair Y.M. Haddara H. Hwang D.E. Ioannou R. Katsumata Z. Liu M. Song R. Thewes J. Wang-Ratkovic M.R. Wordeman Interconnect J.J. Clement, Chair J.R. Lloyd, Vice Chair L. Arnaud T.N.D. Marieb | |||||
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A. Preussger K.P. Rodbell H.A. Schafft J.A. Walls MEMS W.M. Miller S.A. Kayali S. Arney P.J. Boudreaux M.R. Douglass G. Johnson A. Witvrouw Process Induced Damage T.B. Hook, Chair P.E. Nicollian, Vice Chair B.L. Bhuva N.D. Bui C. Gabriel S. Krishnan | ||||
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J.P. McVittie | |||||
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