Stephen Thomas III received the B.S.E. (1992), M.S.E. (1993), and Ph.D. (1997) in electrical engineering from the University of Michigan. At the University of Michigan, Dr. Thomas developed in situ diagnostics for real time control of advanced dry etch processes. He also used e-beam lithography and dry etching to fabricate structures with high aspect ratio and nanometer scale linewidths. He joined HRL Labs in 1997 where his job assignments include work on process development for GaInAs/AlInAs based HBT ICs and HBT/RTD integration, and HBT reliability characterization and improvement. Dr. Thomas has authored or coauthored over forty papers related to dry etching and III-V semiconductor processing. He is currently serving as an associate editor for the Journal of Electronic Materials.