Glenn Alers received the Ph.D. (1992) from the University of Illinois, Urbana-Champaign. He was a member of the technical staff at Bell Labs, Lucent Technologies from 1993-2000. During this time, he worked on electromigration in aluminum, thin gate oxide reliability and high-k dielectrics. Presently, he is a program manager in the integration group of Novellus Systems responsible for reliability of copper, barriers and low-k dielectrics.