IRPS 2008 Workshops Tuesday, April 29th, 7:00p.m. - 9:00p.m.
	workshop topic	moderators	affiliation	country	status
1	Product Reliability	Tom Anderson	TI	USA	accepted
2	High-K dielectric measurements	Jim Stathis	IBM	USA	accepted
		Eric Vogel	Univ. of Texas, Dallas
3	Physical mechanisms behind NBTI/PBTI	Tibor Grasser	University of Viennna	Austria	accepted
		Hans Reisinger	Infineon Technologies	Germany	accepted
4	fWLR Monitoring (standardization)	Andreas Martin	Infineon Technologies	Germany	accepted
5	Stress migration	Martina Hommel	Infineon Technologies	Germany	accepted
6	BEOL low K dielectric reliability (BEOL TDDB)	Oliver Aubel	AMD	Germany	accepted
		Fen Chen	IBM	USA	accepted
7	The quest for universal NVM reliability standards	Meir Janai	Saifun Semiconductors Ltd	USA	accepted
8	Reliable products with unreliable devices: Challenges	Vincent Huard	ST Micro	France	accepted