
Call for Papers
Inside Call for Papers: Call for Papers/Topics of Interest l Abstract Submission
Deadline of submission was extended.
Late News Paper due January 29, 2024
If you are going to submit your late news paper, please visit here.
2024 International ESD Workshop(IEW 2024) in US will again co-locate with the International Reliability Physics Symposium 2024 (IRPS 2024) on April 14th - 18th 2024, Hilton DFW Lakes, Dallas, Texas. Therefore, submissions to IEW 2024 and/or IRPS 2024 will receive exposure to a much broader audience. Upload your IEW-US abstract presentation to the ExOrdo Abstract Submission Site HERE. For more details please visit IEW 2024 web site.
IEW:
Please upload your Poster Presentation in PDF format for consideration not later than 19 February.
Authors will be notified of acceptance status 23 February.
If accepted, you will be asked to also submit Teaser slides – Dead line TBD.
IRPS 2024 focus topics:
GAA, nanosheet, RibbonFETTM, Forksheets, SiGe Channels: TDDB, BTI, HCI, high voltage effects
3D packaging and heterogeneous integration: 3D, enhanced 2D, chiplets, Si bridge, interposer, RDL technology, hybrid bonding, micro-bump, Cu-pillar and other interconnects
Reliability-aware EDA: device to circuit and systems, reliability in DTCO, electromigration assessments, thermal characterization, logic, memory, high-reliability applications
Papers in the Following Areas are Requested:
Circuits, Products, and Systems
Circuit Reliability and Aging – Includes digital and analog circuit design for reliability, aging assessments and compact models from circuits to systems; use of EDA tools; radiation and electromagnetic effects on fresh and aged chips.
ESD and Latchup – Component and system-level ESD design, development and characterization. Latchup detection, prevention and mitigation. Includes numerical modeling, physics, simulation, troubleshooting and FA.
Packaging and 2.5D/3D Assembly – Includes chip-package interaction; fatigue; power dissipation issues; reliability of 2.5D and 3D IC packaging and integration, interconnects, multichip modules, passive interposers.
Product Reliability – Chip level reliability modeling, DFR, reliability aware design/monitor, EDA solution, reliability validation from Pre-Si to Post-Si for SOC, Chiplet, MCM and SIP; electrical, thermal, mechanical risk and electromagnetic effect for products in various markets.
Radiation Effects Reliability – Includes basic mechanism and impact analysis of radiation effects on components and systems; Component, system and application-level modeling, simulation, testing, and mitigation techniques for radiation effects induced reliability issues.
Reliability Testing – Includes reliability test development and design, new methodologies, novel analysis methods and techniques, reliability physics and failure mechanism, reliability test equipment, tools, and test structures.
RF/mmW/5G – RF reliability test and modeling of CMOS, BiCMOS, SiGe, GaN, III-V devices for GHz and THz applications for devices such as PA, LNA, mixers, and high-speed switches. Reliability of novel materials and device architectures for RF/mmW/5G and beyond.
System Electronics Reliability – Reliability of electronic systems used in consumer electronics, data centers, health care, space, automotive, etc.; architecture, design, modeling, telemetry, electromagnetic effects, and large-scale analysis techniques such as machine and deep learning.
Materials, Processing, and Devices
Emerging memory – Novel memory devices based on magnetics (e.g., STT, SOT, VCMA), or resistive (selector or memory element) RAM, ferroelectrics, or phase change memory for eNVM or stand-alone applications.
Failure Analysis – Includes evidence of new failure mechanisms; advances in failure analysis techniques.
Gallium-Nitride and Silicon-Carbide Wide-Bandgap Semiconductors – threshold voltage instabilities, charge trapping, switching stress, breakdown and other reliability topics including thermal issues within power devices.
Gate/MOL Dielectrics – Includes reliability of novel gate dielectrics and ferroelectrics; 2D layered dielectrics and van der Waals dielectrics for 2D materials-based devices; modeling of dielectric breakdown; gate dielectric reliability for III-V, Ge, and advanced FETs; middle-of-the-line reliability; MIM/MOM capacitors.
Memory Reliability – Includes stand-alone volatile memories (SRAM, DRAM), planar and 3D NAND Flash memories, embedded memories (stand-alone and on-chip) and SSDs.
Metallization/BEOL Reliability – Includes electro-migration; Joule heating; stress migration; low-k dielectric breakdown.
Neuromorphic Computing Reliability – Reliability of logic and memory (MRAM, RRAM, PCM, Ferroelectrics, Flash, etc.) devices, and their interactions with materials, circuits, architectures, and algorithms used in NC and AI.
Process Integration – Includes manufacturing process such as PID/charging, anneals/implants etc. impact on component reliability, existing and new process-related reliability issues in production; foundry reliability challenges.
Transistors – Includes hot carrier phenomena; BTI; RTN; advanced node scaling; variability; Ge and III-V channels; nano-wire, gate all-around, nano-ribbon, fork-sheet devices.